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Mechanical properties of ALD films (MECHALD)

08/04/2014 00:00 - 08/04/2014 00:00  

Welcome to public seminar on

Mechanical properties of ALD films (MECHALD)

A public seminar will be organized on the MECHALD Tekes project on on Tuesday, April 8.

In MECHALD, seven research groups from three organizations – VTT, Aalto University and Jyväskylä University – have joined forces to investigate the mechanical properties of films made by the atomic layer deposition (ALD) technique in a comprehensive, multidisciplinary manner. MECHALD has concentrated on wafer applications (silicon, …) but the resulting mechanical properties of ALD films are relevant to a significantly boarder application area.

We are looking forward to an interactive seminar with networking possibilities. Participation is free but requires registration. Link for registration:




11.30–12.00 Registration and coffee

12:00-12:30 Opening and introduction to the MECHALD project

12.30–14.00 Measurement systems used in MECHALD (several short presentations)

14:00-15:00 Posters show & Coffee

15:00-15:30 Overview of mechanical properties of ALD films studied in MECHALD (Al2O3, TiN, ATO, SiO2, other)

15:30-17:00 MECHALD and beyond (several presentations)

17:00-19:00 Networking

Please registrate here!


On behalf of the whole project group,

Riikka Puurunen, MECHALD coordinator